| 摘要 |
PURPOSE: A substrate processing device accurately measures silicon concentrations in a phosphoric acid aqueous solution flowing through a circulation line. CONSTITUTION: A circulation line (3) includes a processing bath (11), a circulation pump (13), a circulation heater (15), and a filter (17). The processing tank stores a phosphoric acid aqueous solution. The circulation heater heats the phosphoric acid aqueous solution. The circulation line controls the phosphoric acid aqueous solution to be discharged from the processing tank to flow in order of the circulation pump, the circulation heater, and the filter. A branch pipe (31) branches from the circulation line and extracts the phosphoric acid aqueous solution from the circulation line. A concentration measurement unit (51) measures silicon concentrations in the phosphoric acid aqueous solution by potentiometry. [Reference numerals] (57) Charge difference measurement unit; (61) Control unit; (AA,CC) Drain; (BB) Reagent supply source |
