发明名称 Focused ion beam device and focused ion beam processing method
摘要 Disclosed is an operation for an optical system which achieves observation of focused ion beam processing equivalent to that in a case wherein a sample stage is tilted mechanically. In a focused ion beam optical system, an aperture, a tilting deflector, a beam scanner, and an objective lens are controlled so as to irradiate an ion beam tilted to the optical axis of the optical system, thereby achieving thin film processing and a cross section processing without accompanying adjustment and operation for a sample stage. The thin film processing and the cross section processing with a focused ion beam can be automated, and yield can be improved. For example, by applying the present invention to a cross section monitor to detect an end point, the cross section processing can be easily automated.
申请公布号 US8552397(B2) 申请公布日期 2013.10.08
申请号 US201013513256 申请日期 2010.11.15
申请人 MADOKORO YUICHI;KANEOYA HIROKAZU;ONISHI TSUYOSHI;SEKIHARA ISAMU;HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 MADOKORO YUICHI;KANEOYA HIROKAZU;ONISHI TSUYOSHI;SEKIHARA ISAMU
分类号 H01J3/28;G21K1/00 主分类号 H01J3/28
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