发明名称 Semiconductor device
摘要 The semiconductor device includes: a first conductive-type first well and a second conductive-type second well configured over a substrate to contact each other; a second conductive-type anti-diffusion region configured in an interface where the first conductive-type first well contacts the second conductive-type second well over the substrate; and a gate electrode configured to simultaneously cross the first conductive-type first well, the second conductive-type anti-diffusion region, and the second conductive-type second well over the substrate.
申请公布号 US8552497(B2) 申请公布日期 2013.10.08
申请号 US201113290535 申请日期 2011.11.07
申请人 CHA JAE-HAN;LEE KYUNG-HO;KIM SUN-GOO;CHOI HYUNG-SUK;KIM JU-HO;CHAE JIN-YOUNG;OH IN-TAEK;MAGNACHIP SEMICONDUCTOR, LTD. 发明人 CHA JAE-HAN;LEE KYUNG-HO;KIM SUN-GOO;CHOI HYUNG-SUK;KIM JU-HO;CHAE JIN-YOUNG;OH IN-TAEK
分类号 H01L29/66 主分类号 H01L29/66
代理机构 代理人
主权项
地址
您可能感兴趣的专利