SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM

摘要

PURPOSE: A substrate processing system, a substrate processing method, and a storage medium suppress the absorption of moisture for a drying prevention liquid by supplying low-humidity gas with less moisture contents to a substrate when the substrate is transferred. CONSTITUTION: A liquid processing device processes a liquid by supplying a processing solution to a substrate (W). The liquid processing device supplies a drying prevention liquid to the surface of the substrate. A supercritical processing device (4) substitutes a high-pressure liquid for the liquid on the surface of the substrate and removes the liquid within a container (41) which receives the substrate. A substrate transfer device transfers the substrate from the liquid processing device to the supercritical processing device along a transfer path. A low-humidity gas supply unit (23) supplies low-humidity gas around the substrate transferred from the transfer path. [Reference numerals] (1) Washing processing system; (2) Wafer returning equipment; (3) Washing device; (4) Supercritical processing device; (5) Control unit