METHOD OF DESIGNING PATTERN LAYOUTS

摘要

PURPOSE: A method of designing a pattern layout forms a layout of the accurately corrected final pattern by separating a correction for compensating for an optical proximity effect and a correction for compensating for a light range effect. CONSTITUTION: First layouts of multiple chip regions are generated. Firstly corrected layouts of the chip regions are formed. Secondary corrected layouts of the chip regions are formed. The final layouts of the chip regions are formed. [Reference numerals] (AA) Generate initial layouts of more than two chip regions; (BB) Generate firstly-corrected layouts of the more than two chip regions; (CC) Generate secondly-corrected layouts of the more than two chip regions; (DD) Generate final layouts of the more than two chip regions