| 摘要 |
PURPOSE: A polyamide resin composition is provided to have excellent permanent UV-blocking performance, to improve spinning performance, and to obtain clear dyeability based on the transparency thereof. CONSTITUTION: A UV-blocking polyamide composition comprises 100.0 parts by weight of a polyamide resin, 0.01-5 parts by weight of a polyamide-based ionomer, and 0.01-5 parts by weight of an inorganic nanoparticle with an average particle diameter of 5-500 nm. The polyamide-based ionomer is obtained by the condensation reaction of dicarboxylic acid, which contains dicarboxylic acid, diamine, and organic acid metal base, or the alkylester thereof. The polyamide resin is one or a mixture of two or more selected from a crystalline aliphatic polyamide, amorphous copolyamide, and aromatic polyamide. |
