发明名称 Fuente de iones con hueco en el electrodo
摘要 An ion source capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions is provided. The ion source includes at least one anode and at least one cathode. In certain example embodiments, the anode may have a recess formed therein in which ions to be included in the ion beam may accelerate. Walls of the recess optionally may be insulated using, for example, ceramic. One or more holes may be provided to allow a supply of gas to flow into the recess, and those holes optionally may be tapered such that they narrow towards the recess. Thus, certain example embodiments produce an ion source having a higher energy efficiency (e.g., having increasing ion energy).
申请公布号 ES2424764(T3) 申请公布日期 2013.10.08
申请号 ES20070835800T 申请日期 2007.06.12
申请人 GUARDIAN INDUSTRIES CORP. 发明人 MURPHY, NESTOR P.;ROCK, DAVID
分类号 H01J37/08;H01J27/02;H01J27/14 主分类号 H01J37/08
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