SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of uniformly processing both front and rear faces of a substrate having flexibility without coming into contact with a contact-inhibited region at the center part of the substrate.SOLUTION: The substrate processing apparatus comprises: a carrying-in part 1; a processing tank 2; a water-washing tank 4; a drying tank 5; a carrying-out part 6; and endless belts 7 for sequentially transporting the substrate to the carrying-in part 1, the processing tank 2, the water-washing tank 4, the drying tank 5 and the carrying-out part 6. The substrate processing apparatus also has a fixing mechanism for fixing a pair of edges of the substrate parallel to a transporting direction thereof to a pair of endless belts 7. A plurality of substrates are fixed to the pair of endless belts 7 at the pair of edges parallel to the transporting direction at a fixed pitch in the carrying-in part 1. In addition, the substrate having been processed is removed from the pair of endless belts 7 in the carrying-out part 6.