发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a compound semiconductor device which can establish appropriate characteristics, while achieving a normally-off operation, and a method for manufacturing the same.SOLUTION: A compound semiconductor device comprises: a substrate 11; an electron transit layer 15 and an electron supply layer 17 formed above the substrate 11; and a gate electrode 19g, a source electrode 19s and a drain electrode 19d formed above the electron supply layer 17. The device further comprises an Fe doping layer 14 formed in a region which is overlapped with the gate electrode 19g in plan view between the substrate 11 and the electron transit layer 15, and in which Fe is doped for suppressing a two-dimentional electron gas 100 that is below the gate electrode 19g.
申请公布号 JP2013207103(A) 申请公布日期 2013.10.07
申请号 JP20120075004 申请日期 2012.03.28
申请人 FUJITSU LTD 发明人 KAMATA YOICHI
分类号 H01L21/338;H01L21/205;H01L29/778;H01L29/812 主分类号 H01L21/338
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