| 摘要 |
PROBLEM TO BE SOLVED: To provide a management substrate for a pattern drawing device that allows visualization and digitization of an uneven defect caused by a dimension deviation of a pattern and a position deviation thereof to manage a drawing accuracy state of the pattern drawing device, allows for adjustment and management of the drawing device at an appropriate time without waste and contributes to reduction in maintenance and management expenditures and improvement of a product yield.SOLUTION: A management substrate for maintaining and managing drawing accuracy of the pattern drawing device to form a pattern on a substrate includes at least one or more kinds of management rectangular area groups that are composed of a plurality of rectangular areas having patterns formed by the same material and the same manufacturing method as the substrate and arrayed in an X direction and a Y direction of the mutually orthogonal patterns, and allow for management of at least one or more pattern drawing devices for a management target. |
