发明名称 METHOD AND APPARATUS OF FORMING UV-CURED FILM
摘要 PROBLEM TO BE SOLVED: To form an excellent UV-cured film while avoiding increase in the size of a UV-irradiation apparatus, when forming a UV-cured film on a substrate.SOLUTION: In the method of forming a UV-cured film, thickness of a coating liquid film 3 that is irradiated with a UV-ray in a UV-ray irradiation step is set thin on the start of irradiation A side, and thick on the end of irradiation B side.
申请公布号 JP2013206858(A) 申请公布日期 2013.10.07
申请号 JP20120077734 申请日期 2012.03.29
申请人 SHIBAURA MECHATRONICS CORP 发明人
分类号 H05B33/10;H01L51/50;H05B33/04 主分类号 H05B33/10
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