发明名称 ANTENNA DEVICE, AND PLASMA PROCESSING APPARATUS AND SPUTTERING APPARATUS HAVING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an antenna device capable of generating an inductively-coupled plasma and suppressing raise in a plasma potential.SOLUTION: An antenna device 20 comprises: an antenna 30 located in a vacuum container 2; a high-frequency power supply 40 applying a high-frequency current Ito the antenna 30; and a matching circuit 42. The antenna 30 has a coaxial structure having an internal conductor 32, an external conductor 34 covering the outside of the internal conductor 32 at least over the total length located in the vacuum container 2, and a dielectric body 36 electrically insulating between both the conductors. The antenna 30 also has a water-cooling structure for cooling the antenna 30 by circulating cooling water in the internal conductor 32. The high-frequency power supply 40 is connected to one end part of the internal conductor 32 via the matching circuit 42. The other end part of the internal conductor 32 is grounded. The external conductor 34 consists of a non-magnetic body, and is grounded at one end part.
申请公布号 JP2013206652(A) 申请公布日期 2013.10.07
申请号 JP20120072870 申请日期 2012.03.28
申请人 NISSIN ELECTRIC CO LTD 发明人 ANDO YASUNORI
分类号 H05H1/46;C23C14/40;C23C16/509;H01L21/203;H01L21/205;H01L21/3065;H01L21/31 主分类号 H05H1/46
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