INFORMATION CALCULATION METHOD, STAGE DEVICE, EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To suppress occurrence of poor exposure.SOLUTION: An information calculation method includes calculating movement information of a substrate P so that after the speed of relative movement between the substrate P exposed via an immersion space (LS) and the immersion space (LS) brought into contact with the substrate P is changed, the direction of the relative movement of the liquid immersion space LS is reversed on the outside of the substrate P (MV3).