| 摘要 |
PROBLEM TO BE SOLVED: To make a substrate successfully repel water using sililation reagent and activator.SOLUTION: According to the present invention, a substrate liquid processing apparatus (1) comprises: a sililation reagent supply passage (41) to supply sililation reagent to a substrate (6); an activator supply passage (45) to supply activator for activating the sililation reagent; a merging part (48) which is located in a middle part of the sililation reagent supply (41) and at which the activator supply passage (45) is connected; a nozzle block (a water repellency agent discharge nozzle 37) to supply a water repellency agent generated by merging the sililation reagent and the activator in the merging part (48), to the substrate (6). When the sililation reagent is supplied to the substrate (6), the activator to activate the sililation reagent is added to the sililation reagent in a way to be supplied, and the water repellency agent is generated, then the water repellency agent is discharged toward the substrate (6). |
