发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PERMANENT MASK RESIST USING THE SAME, AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is excellent in sensitivity, resolution, solder heat resistance, gold plating resistance, and HAST resistance, and whose solder resist surface is matte.SOLUTION: A photosensitive resin composition contains (A) component: a compound obtained by reacting at least an epoxy resin and (meth)acrylic acid, (B) component: a polymerizable compound having ethylenic unsaturated linkage, (C) component: urethane beads, and (D) component: photopolymerization initiator.
申请公布号 JP2013205624(A) 申请公布日期 2013.10.07
申请号 JP20120074659 申请日期 2012.03.28
申请人 HITACHI CHEMICAL CO LTD 发明人 YOSHIDA TETSUYA;FUJII TETSUFUMI
分类号 G03F7/027;C08F2/50;C08F283/00;C08F290/00;G03F7/004;H05K3/28 主分类号 G03F7/027
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