| 摘要 |
PURPOSE: A processing apparatus of material which forms a semiconductor layer in the outer periphery of a conductivity core is provided to have a simple structure and economize the production facility, thereby quickly and simply executing the processing and increasing the productivity. CONSTITUTION: A processing apparatus of material, which coats the silicon on the outer periphery of a conductivity core (1), is comprised of an accommodation path (3) which accommodates a fluid silicone fusing liquid (S), an entrance pipe (4) which connects the inside and outside of the accommodation path and enables the conductivity core to penetrate the accommodation path from the outside to the inside, and a discharge tube (5) which connects the inside and outside of the accommodation path to ejects the conductivity core, which entered inside the accommodation path through the entrance pipe, to the outside of the accommodation path. |
