ION MILLING APPARATUS

摘要

The purpose of the present invention is to provide an ion milling apparatus that has a simple structure and in which a processing range can be set with high-precision. In order to achieve the abovementioned purpose, proposed is an ion milling apparatus that is provided with a sample holder that holds a sample and a mask that partially restricts radiation of an ion beam to the sample. The sample holder is provided with: first contact faces with which an end face of the sample that is positioned at the side of the passing trajectory of the ion beam comes in contact; and second contact faces that come in contact with an end face of the mask at positions further away from the ion beam than the first contact face so as to position the mask.