发明名称 GALLIUM NITRIDE-BASED LIGHT-EMITTING DIODE
摘要 <p>A gallium nitride-based light-emitting diode is disclosed. The light-emitting diode includes: a gallium nitride substrate; a first gallium nitride-based semiconductor layer that is located on the gallium nitride substrate; a second gallium nitride-based semiconductor layer that is located on the first semiconductor layer; an active layer having a multiple quantum well structure that is located between the first semiconductor layer and the second semiconductor layer; and a gallium nitride-based electron blocking layer that is located between the active layer and the second semiconductor layer. Furthermore, the first semiconductor layer has a thickness of 5 mum to 15mum, and the electron blocking layer is a four-component gallium nitride-based semiconductor layer that contains aluminum and indium. It is possible to reduce forward voltage and improve light-emitting efficiency by increasing the relative thickness of the first semiconductor layer.</p>
申请公布号 WO2013147453(A1) 申请公布日期 2013.10.03
申请号 WO2013KR02320 申请日期 2013.03.21
申请人 SEOUL OPTO DEVICE CO., LTD. 发明人 CHOI, SEUNG KYU;KIM, CHAE HON;JUNG, JUNG WHAN
分类号 H01L33/30;H01L33/04;H01L33/14 主分类号 H01L33/30
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