MEMS DEVICE AND PROCESS FOR PRODUCING SAME

摘要

Provided are an MEMS device in which a plurality of through-holes can be arranged at a high density and an end portion of each through-hole has a tapered shape and a process for producing the MEMS device. Through-holes in which the sidewalls are vertical and the bottom parts taper are provided through processing comprising: a step in which a silicon substrate having a flat surface comprising a (100) crystal plane is patterned to dispose quadrilateral areas of desired dimensions thereon and the areas are etched to a desired depth by dry etching that is capable of processing in a high aspect ratio; and a step in which anisotropic wet etching is conducted with an aqueous potassium hydroxide solution with which isopropyl alcohol has been mixed.