发明名称 SUBSTRATE PROCESSING APPARATUS, METHOD FOR CONTROLLING SUBSTRATE PROCESSING APPARATUS, METHOD FOR MAINTAINING SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
摘要 <p>In order to control execution of respective maintenance recipes for cleaning, and to suitably execute the maintenance recipes, provided is a substrate processing apparatus that is configured of at least: an operation unit, which is provided with a storage unit that stores at least various kinds of recipes including a recipe for processing a member that constitutes the inside of a reacting furnace in which substrate processing is performed, and a recipe for processing an air release pipe having flowing therein a gas released from the inside of the reacting furnace, and which is also provided with a display unit that displays set conditions for executing the recipes at least on an operation screen; and a control unit that executes the recipes that met the set conditions. Specifically, the operation unit is provided with a recipe control unit, which controls execution of, among the recipes stored in the storage unit, the recipe for processing, on the basis of the set conditions, the member constituting the inside of the reacting furnace in which the substrate processing is performed, and the recipe for processing the air release pipe on the basis of the set conditions.</p>
申请公布号 WO2013146595(A1) 申请公布日期 2013.10.03
申请号 WO2013JP58323 申请日期 2013.03.22
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 NISHIURA, SUSUMU;INOSHIMA, KAORI;MITSUI, HIROYUKI;EKKO, HIROSHI
分类号 H01L21/31;C23C16/44;H01L21/205 主分类号 H01L21/31
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