发明名称 PHOTOSENSITIVE BLACK RESIN COMPOSITION AND RESIN BLACK MATRIX SUBSTRATE
摘要 The purpose of the present invention is to provide the following: a black resin composition with which, if a resin black matrix has been formed on a glass substrate, adhesiveness to the substrate during such development is good, solubility with the developing solution is good, and high definition pattern workability is possible; a resin black matrix substrate that uses such a photosensitive black resin composition; and a light-blocking film for a color filter or touch panel. The present invention provides a photosensitive black resin composition comprising at least a light-blocking material, an alkali-soluble resin, a photopolymerization initiator, and a solvent, wherein the composition contains at least an oxetane compound having a specific structure as an additive, and contains 1.5 to 10.0 wt% of the oxetane compound in terms of the total of the light-blocking material and alkali-soluble resin.
申请公布号 WO2013146183(A1) 申请公布日期 2013.10.03
申请号 WO2013JP56437 申请日期 2013.03.08
申请人 TORAY INDUSTRIES, INC. 发明人 AIHARA, RYOSUKE;INOUE, YOSHIHIKO
分类号 G03F7/004;G02B5/20;G03F7/075;H05B33/22 主分类号 G03F7/004
代理机构 代理人
主权项
地址