TRAY FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To extend the use life of a tray for a plasma processing apparatus.SOLUTION: A tray 15 for a plasma processing apparatus is provided with substrate housing holes 19A to 19D that penetrate through the tray 15 in a thickness direction and includes substrate supporting parts 21 which protrude from hole walls 15d of the substrate housing holes 19A to 19D and support outer edge parts of lower surfaces of substrates respectively housed in the substrate housing holes 19A to 19D. The tray 15 includes: a tray body 15a; and removable members 211A to 211D that are removably attached to the tray body 15a and form the upper surface side of the tray body 15a that include at least the substrate housing holes 19A to 19D.