| 摘要 |
<p>The purpose of the present invention is to provide: a gas barrier film which exhibits high gas barrier performance, while having excellent transparency, durability and flexibility; and a method for producing the gas barrier film. A gas barrier film of the present invention has a composition ratio of nitrogen to silicon in the film, namely N/Si of 1.00-1.35, a film density of 2.1-2.4 g/cm3, a film thickness of 10-60 nm, and a thickness of a mixed layer of 5-40 nm, said mixed layer being at the interface between a substrate and an inorganic film.</p> |
