发明名称 |
SUBSTRATE PROCESSING SYSTEM HAVING SYMMETRIC RF DISTRIBUTION AND RETURN PATHS |
摘要 |
A processing system may include a target having a central axis normal thereto; a source distribution plate having a target facing side opposing a backside of the target, wherein the source distribution plate includes a plurality of first features such that a first distance of a first radial RF distribution path along a given first diameter is about equal to a second distance of an opposing second radial RF distribution path along the given first diameter; and a ground plate opposing a target opposing side of the source distribution plate and having a plurality of second features disposed about the central axis and corresponding to the plurality of first features, wherein a third distance of a first radial RF return path along a given second diameter is about equal to a fourth distance of an opposing second radial RF return path along the given second diameter.
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申请公布号 |
US2013256127(A1) |
申请公布日期 |
2013.10.03 |
申请号 |
US201213436776 |
申请日期 |
2012.03.30 |
申请人 |
YOUNG DONNY;RITCHIE ALAN;RASHEED MUHAMMAD;MILLER KEITH A.;APPLIED MATERIALS, INC. |
发明人 |
YOUNG DONNY;RITCHIE ALAN;RASHEED MUHAMMAD;MILLER KEITH A. |
分类号 |
C23C14/35;C23C14/34 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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