| 摘要 |
PROBLEM TO BE SOLVED: To prevent an alignment mark transferred with a transfer target object onto a substrate from becoming an obstacle in a later alignment process.SOLUTION: A first alignment mark AM1 formed on a substrate side in advance has a plurality of graphic patterns AP11-AP14 arranged separately from each other, and an alignment mark transfer area TR is surrounded by the graphic patterns AP11-AP14. A second alignment mark AM21 made of a pattern formation material on a blanket carrying a pattern is imaged together with the first alignment mark AM1, and according to a position detection result thereof, the substrate and the blanket are aligned. At this point, the second alignment mark is positioned in the alignment mark transfer area TR and transferred onto the substrate while being positioned at a location separate from the graphic patterns AP11-AP14 and the transferred second alignment mark. |
