| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus that uses laser light as exposure light and can utilize power of a laser light source with high efficiency when lighting conditions are changed, an exposure method, and a device manufacturing method.SOLUTION: A lighting system IS of an exposure apparatus includes a laser light source 101, a plurality of light guide fibers F11, F12, etc., each having a light guide portion FP that laser light passes through, an optical branching device 102 which branches the laser light from the laser light source 101 into a plurality of light beams and makes them incident on incidence portions FI of the respective light guide fibers F11, F12, etc., and also changes the branching ratio of the laser light, and a lighting portion IL which is provided between emission portions FE of the respective light guide fibers F11, F12, etc., and a mask stage 1 supporting a mask M, and receives the laser light emitted from the emission portions FE of the light guide fibers F11, F12, etc., at different positions to irradiate the mask M. |
