ETCHING TIME DETECTION DEVICE AND METHOD USED FOR ETCHING DEVICE
摘要
<p>An etching time detection device and detection method used for an etching device. The detection device comprises a light wave emitter which is arranged on one substrate of an etching device; a light wave receiver which is arranged on the other substrate of the etching device opposite to the light wave emitter; and a detection system which is communicatively connected to the light wave emitter and the light wave receiver, and is used for receiving a light intensity signal and calculating etching time. The detection device and method achieve automatic detection of the etching time, and effectively avoid an error generated by visual measurement.</p>
