发明名称 |
VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, AND METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE |
摘要 |
A vapor deposition device (50) in accordance with the present invention is a vapor deposition device for forming a film on a film formation substrate (60), including: a vapor deposition source (91) which has a plurality of injection holes (92) from which vapor deposition particles are to be injected towards the film formation substrate (60), the plurality of injection holes (92) being arranged in a line or in a plurality of lines; a vapor deposition crucible (93) for supplying the vapor deposition particles to the vapor deposition source (91) via a pipe (94), the pipe being connected to the vapor deposition source (91) on a side where one end of the line(s) of the plurality of injection holes (92) is located; moving means for moving the film formation substrate (60) relative to the vapor deposition source(s) (91); and a rotation mechanism (100) for rotating the vapor deposition source (91).
|
申请公布号 |
US2013260499(A1) |
申请公布日期 |
2013.10.03 |
申请号 |
US201113992613 |
申请日期 |
2011.12.07 |
申请人 |
SONODA TOHRU;KAWATO SHINICHI;INOUE SATOSHI;HASHIMOTO SATOSHI;SHARP KABUSHIKI KAISHA |
发明人 |
SONODA TOHRU;KAWATO SHINICHI;INOUE SATOSHI;HASHIMOTO SATOSHI |
分类号 |
H01L51/00 |
主分类号 |
H01L51/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|