| 摘要 |
<p>This composition for formation of overlay film for immersion lithography contains a solvent and a polymer component containing a polymer (a1) having a structural unit represented in formula (1). In formula (1), R1 is an alkali dissociable group. A is -CO-O-*, -O-, -NRA- or -SO2-O-*. X is a divalent hydrocarbon group with a carbon number of 1-20, or a divalent fluorinated hydrocarbon group with a carbon number of 1-20. R1 in the formula (1) is preferably a fluorinated alkyl group with a carbon number of 1-20 or a fluorinated alkyl carbonyl group with a carbon number of 1-20.</p> |
