发明名称 SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor storage device having low wiring resistance.SOLUTION: A semiconductor storage device comprises a cell array layer including first wiring, memory cells stacked on the first wiring and second wiring formed on the memory cells so as to be orthogonal to the first wiring. The first wiring includes a level difference in top face which is lower from a memory cell array region in which memory cell arrays are formed to a peripheral region around the memory cell array region.
申请公布号 JP2013201247(A) 申请公布日期 2013.10.03
申请号 JP20120068203 申请日期 2012.03.23
申请人 TOSHIBA CORP 发明人 OZAKI TOMOYA;MOROZUMI NAOTO
分类号 H01L27/105;H01L21/3213;H01L21/768;H01L27/10 主分类号 H01L27/105
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