发明名称 |
METHOD FOR FORMING THIN FILM PATTERN |
摘要 |
The present invention is a method for forming a thin film pattern in which a thin film pattern (14) having a predetermined shape is formed on the surface of a substrate (1) in a region for forming a thin film pattern, said region having a preformed electrode thereon. Said method is configured to include: a step in which a resin film (2) through which visible light passes is adhered to the substrate (1); a step in which the region (11) for forming a thin film pattern on the substrate (1) is irradiated using a laser beam (L), and an opening pattern (21) having the same shape as the thin film pattern (14) is formed on the film (2); a step in which the thin film pattern (14) is formed through the opening pattern (21) of the film (2) on the region (11) for forming a thin film pattern that is on the substrate (1); and a step in which the film (2) is peeled away. As a result, it is possible to easily form a high-definition thin film pattern on the surface of a substrate in a region for forming a thin film pattern, said region having a preformed electrode thereon. |
申请公布号 |
WO2013146661(A1) |
申请公布日期 |
2013.10.03 |
申请号 |
WO2013JP58543 |
申请日期 |
2013.03.25 |
申请人 |
V TECHNOLOGY CO., LTD. |
发明人 |
KUDO, SYUJI;MIZUMURA, MICHINOBU;KAJIYAMA, KOICHI;HANY MAHER AZIZ;KAJIYAMA, YOSHITAKA |
分类号 |
H05B33/10;C23C14/04;C23C14/14;H01L51/50;H05B33/26 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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