发明名称 METHOD FOR FORMING THIN FILM PATTERN
摘要 The present invention is a method for forming a thin film pattern in which a thin film pattern (14) having a predetermined shape is formed on the surface of a substrate (1) in a region for forming a thin film pattern, said region having a preformed electrode thereon. Said method is configured to include: a step in which a resin film (2) through which visible light passes is adhered to the substrate (1); a step in which the region (11) for forming a thin film pattern on the substrate (1) is irradiated using a laser beam (L), and an opening pattern (21) having the same shape as the thin film pattern (14) is formed on the film (2); a step in which the thin film pattern (14) is formed through the opening pattern (21) of the film (2) on the region (11) for forming a thin film pattern that is on the substrate (1); and a step in which the film (2) is peeled away. As a result, it is possible to easily form a high-definition thin film pattern on the surface of a substrate in a region for forming a thin film pattern, said region having a preformed electrode thereon.
申请公布号 WO2013146661(A1) 申请公布日期 2013.10.03
申请号 WO2013JP58543 申请日期 2013.03.25
申请人 V TECHNOLOGY CO., LTD. 发明人 KUDO, SYUJI;MIZUMURA, MICHINOBU;KAJIYAMA, KOICHI;HANY MAHER AZIZ;KAJIYAMA, YOSHITAKA
分类号 H05B33/10;C23C14/04;C23C14/14;H01L51/50;H05B33/26 主分类号 H05B33/10
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