发明名称 FLUORORESIN SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a fluororesin substrate allowing sufficient suppression of warpage occurrence in reflowing and also exhibition of sufficiently excellent, high-frequency properties.SOLUTION: A fluororesin substrate is a fluororesin substrate where a dielectric layer with fluororesin being a main component is formed on a metal conductor and the dielectric layer contains hollow glass beads. The metal conductor has a surface roughness Rz (JIS B 0601-1994) of 2.0 μm or less. The fluororesin is irradiated with ionizing radiation in an irradiation dose of 0.01 to 500 kGy. The fluororesin is one, two, or more kinds of polytetrafluoroethylene (PTFE), a tetrafluoroethylene-perfluoroalkylvinyl ether copolymer (PFA), a tetrafluoroethylene-hexafluoropropylene copolymer (FEP), and a tetrafluoroethylene-ethylene copolymer (ETFE).
申请公布号 JP2013201344(A) 申请公布日期 2013.10.03
申请号 JP20120069591 申请日期 2012.03.26
申请人 SUMITOMO ELECTRIC FINE POLYMER INC 发明人 NAKABAYASHI MAKOTO;IKEDA KAZUAKI
分类号 H05K1/03 主分类号 H05K1/03
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