| 摘要 |
PROBLEM TO BE SOLVED: To allow measurement with high reliability and accuracy.SOLUTION: In a pattern shape measurement method, a plurality of shape models are created with respect to a measurement object pattern, a first optical condition for shape model determination and a second optical condition for shape measurement are determined, a shape model most suitable for shape measurement of the measurement object pattern is selected from among the plurality of shape models, and a shape of the measurement object pattern is calculated by fitting of second and third waveforms. The first and second optical conditions are determined in accordance with first waveforms obtained under a plurality of optical conditions with respect to the plurality of shape models. The most suitable shape model is selected using feature quantities of the first waveforms. The second waveforms are acquired correspondingly to dimensions of the selected shape model while successively changing the dimensions of the selected shape model. The third waveform is acquired by irradiating the measurement object pattern with light under the second optical condition. |
