| 摘要 |
A periodic pattern forming method in which a first polymer and a second polymer of a block copolymer self-assemble and a periodic pattern is formed in a guide layer (210) comprises: a first etching step of etching, with a plasma which is generated from a first gas, the second polymer; a first film forming step of, after the first etching step, forming, on the surface of the first polymer other than the second polymer etching portion and the guide layer, with a plasma which is generated from a second gas, a first protection film (270); and a second etching step of, after the first film forming step, further etching the second polymer with the plasma which is generated from the first gas. |
