| 摘要 |
PROBLEM TO BE SOLVED: To evenly dewater and dry an entire surface of a substrate while preventing secondary contamination, even with a substrate in which a surface outer peripheral part is sealed with a seal member and held with a substrate holder.SOLUTION: A substrate dryer in which a substrate after cleaning whose surface outer peripheral part is sealed with a seal member and held with a substrate holder is disposed vertically and a surface thereof is dried, includes a plurality of jetting nozzles 104a-104d arranged in a plurality of stages in a vertical direction at positions facing a substrate W arranged vertically while being held by a substrate holder 18, for jetting dry gas toward the surface of the substrate, and a control section 118 which controls gas jetting occasion and time of the jetting nozzles positioned at respective stages of the jetting nozzles arranged in a plurality of stages so that a dry area on the substrate surface continuously expands downward from above the substrate arranged vertically. |
