| 摘要 |
The invention relates to a processing station for planar substrates, comprising at least two processing units and at least two transport lines for substrates, which transport lines are arranged parallel to each other, wherein the processing units are placed between the two transport lines and wherein means for moving the substrates from the transport lines to the processing units and back are provided. The means for moving the substrates have four linear transport units, each having at least one substrate support, wherein a first linear transport unit leads from the second transport line to the first processing unit, a second linear transport unit leads from the first transport line to the first processing unit, a third linear transport unit leads from the first transport line to the second processing unit, and a fourth linear transport unit leads from the second transport line to the second processing unit. |
