发明名称 |
NITRIDE COMPOUND SEMICONDUCTOR LAYER, NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, NITRIDE COMPOUND SEMICONDUCTOR LAYER MANUFACTURING METHOD AND NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a nitride compound semiconductor layer which uses a nitride compound semiconductor and has high luminous efficiency; and provide a nitride semiconductor light-emitting device, a nitride compound semiconductor layer manufacturing method and a nitride semiconductor light-emitting device manufacturing method.SOLUTION: A gallium nitride compound semiconductor layer of a present embodiment has a (11-24) plane which is formed on a substrate as a layer surface after performing a surface treatment on the substrate having a perovskite-type crystal structure having a (101) plane or a (011) plane by using a mixed solution of phosphoric acid and sulfuric acid. Accordingly, a nitride semiconductor light-emitting device having high luminous efficiency can be obtained because the GaN compound semiconductor having a semipolar surface of the (11-24) plane as the layer surface which is a crystal plane different from a (0001) plane can be formed from an NdGaOsubstrate. |
申请公布号 |
JP2013201250(A) |
申请公布日期 |
2013.10.03 |
申请号 |
JP20120068279 |
申请日期 |
2012.03.23 |
申请人 |
JX NIPPON MINING & METALS CORP |
发明人 |
MIKAMI MITSURU;TAKAKUSAKI MISAO;YOSHIDA TAKU;SHIMIZU TAKAYUKI;YAMAMOTO MINORU |
分类号 |
H01L21/205;H01L21/306;H01L33/32 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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