发明名称 NITRIDE COMPOUND SEMICONDUCTOR LAYER, NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, NITRIDE COMPOUND SEMICONDUCTOR LAYER MANUFACTURING METHOD AND NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a nitride compound semiconductor layer which uses a nitride compound semiconductor and has high luminous efficiency; and provide a nitride semiconductor light-emitting device, a nitride compound semiconductor layer manufacturing method and a nitride semiconductor light-emitting device manufacturing method.SOLUTION: A gallium nitride compound semiconductor layer of a present embodiment has a (11-24) plane which is formed on a substrate as a layer surface after performing a surface treatment on the substrate having a perovskite-type crystal structure having a (101) plane or a (011) plane by using a mixed solution of phosphoric acid and sulfuric acid. Accordingly, a nitride semiconductor light-emitting device having high luminous efficiency can be obtained because the GaN compound semiconductor having a semipolar surface of the (11-24) plane as the layer surface which is a crystal plane different from a (0001) plane can be formed from an NdGaOsubstrate.
申请公布号 JP2013201250(A) 申请公布日期 2013.10.03
申请号 JP20120068279 申请日期 2012.03.23
申请人 JX NIPPON MINING & METALS CORP 发明人 MIKAMI MITSURU;TAKAKUSAKI MISAO;YOSHIDA TAKU;SHIMIZU TAKAYUKI;YAMAMOTO MINORU
分类号 H01L21/205;H01L21/306;H01L33/32 主分类号 H01L21/205
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