发明名称 |
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION USED THEREIN, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE |
摘要 |
<p>There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive composition containing (A) a non-polymeric acid-decomposable compound having an aromatic ring and a molecular weight of 500 to 5,000 and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.</p> |
申请公布号 |
WO2013147311(A1) |
申请公布日期 |
2013.10.03 |
申请号 |
WO2013JP60138 |
申请日期 |
2013.03.27 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
TAKAHASHI, HIDENORI |
分类号 |
G03F7/004;C07C39/17;C07C69/734;C07C69/96;G03F7/038;G03F7/039;G03F7/32;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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