| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition that enables a resist pattern to be produced with a wide exposure margin, and a new compound (salt) useful as a component of the resist composition.SOLUTION: A resist composition contains salt represented by formula (I), resin which increases solubility on an alkaline aqueous solution by acid action, an acid generator (B), and a solvent, where in the formula, Xrepresents an aliphatic saturated hydrocarbon group or the like, Xrepresents a fluoroalkyl group, and Wrepresents an alicyclic hydrocarbon group or the like. |
