| 摘要 |
<p>Provided is a manufacturing method of an organic thin-film transistor array substrate, comprising the following steps: respectively forming patterns comprising a gate (2a), a gate line (2b), an insulating layer, an organic semiconductor layer (5), a barrier layer (6), a source (7a), a drain (7b) and a data line (10) through a patterning process. The patterns of the organic semiconductor layer (5) and the barrier layer (6) are formed by one-time patterning process. The method can further reduce the number of times of the patterning process, thereby improving the production efficiency and reducing the production cost.</p> |
