发明名称 PRODUCTION METHOD FOR FILM WITH COATING
摘要 <p>This production method makes it possible to effectively prevent cratering by means of a simple configuration without increasing product thickness, even when a coating liquid is applied on an inorganic vapor-deposited film that has been vapor-deposited in advance on a support body. A coating liquid preparation device (12) that prepares a coating liquid comprising an active ray-curable component, a coating device (18) that applies the coating liquid on an inorganic vapor-deposited film that has been vapor-deposited in advance on a band-shaped support body (20) in order to form a coating (10), a first irradiation device (26) that irradiates the coating (10) with active rays, and a drying device (28) that dries the irradiated coating (10) are provided in this order. The coating (10) is irradiated with active rays at the first irradiation device (26) while in a wet state, and the cure rate of the curable component within the coating is set in the range of 10-80%.</p>
申请公布号 WO2013146730(A1) 申请公布日期 2013.10.03
申请号 WO2013JP58685 申请日期 2013.03.26
申请人 FUJIFILM CORPORATION 发明人 KUNIYASU, SATOSHI
分类号 B05D7/24;B05D3/06;B05D7/00 主分类号 B05D7/24
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