| 摘要 |
Plasma spray method for manufacturing an ion conducting membrane, preferably a hydrogen ion conducting membrane or an oxygen ion conducting membrane, comprises depositing the membrane as a layer (11) on a substrate (10) in a process chamber (12); spraying a starting material on a coating surface of the substrate by a process gas in the form of a process beam (2); and injecting the starting material into a plasma at a low process pressure, where the substrate has pores which are connected to one another such that the substrate is gas permeable. Plasma spray method for manufacturing an ion conducting membrane, preferably a hydrogen ion conducting membrane or an oxygen ion conducting membrane, comprises depositing the membrane as a layer (11) on a substrate (10) in a process chamber (12); spraying a starting material on a coating surface of the substrate by a process gas in the form of a process beam (2); and injecting the starting material into a plasma at a low process pressure which is not > 10000 Pa and is partially or completely melting the starting material, where the substrate has pores which are connected to one another such that the substrate is gas permeable and a portion of entire pore area of entire area of the coating surface is at least 30%, preferably to at least 40%. An independent claim is also included for an ion conducting membrane, preferably hydrogen ion conducting membrane or an oxygen ion conducting membrane on a substrate, which is deposited as a layer on the substrate with a plasma spray method in a process chamber. |
