发明名称 Method of forming ferrite thin film and ferrite thin film obtained using the same
摘要 <p>[Task] To provide a method of forming a ferrite thin film in which it is possible to manufacture a thick film having a film thickness of 1 µm or more using a sol-gel method without causing cracking. [Means for Resolution] A method of forming a ferrite thin film by carrying out a process for forming a coated film by coating a ferrite thin film-forming composition on a heat-resistant substrate and a process for calcining the coated film once or a plurality of times so that the thickness of the calcined film on the substrate becomes a desired thickness, and firing the calcined film formed on the substrate, in which the conditions for firing the calcined film formed on the substrate are under the atmosphere or an oxygen gas or inert gas atmosphere, a temperature-rise rate of 1°C/minute to 50°C/minute, a holding temperature of 500°C to 800°C, and a holding time of 30 minutes to 120 minutes.</p>
申请公布号 EP2645383(A2) 申请公布日期 2013.10.02
申请号 EP20130160995 申请日期 2013.03.26
申请人 MITSUBISHI MATERIALS CORPORATION 发明人 DOI, TOSHIHIRO;SAKURAI, HIDEAKI;NAKAMURA, KENZO;IGARASHI, KAZUNORI;SOYAMA, NOBUYUKI
分类号 H01F10/20;H01F41/24 主分类号 H01F10/20
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