METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING LAYERS

摘要

PURPOSE: A method for manufacturing a chemical machine polishing layer is provided to minimize or remove undesirable density defects, thereby minimizing the surface illumination of the surface of the polishing layer. CONSTITUTION: A method for manufacturing a chemical machine polishing layer includes the following steps of: preparing a mold base (2) and a mold (1) having a wall (8) attached to the mold base; preparing a linear (4) having a mean thickness of 2-10 cm, an upper surface (6), and a lower surface (3); providing an adhesive (7) and curable materials including a pre-polymer; providing a nozzle with a nozzle opening; providing a skiver blade with a cut edge portion; forming a mold cavity with the upper surface and the wall of the linear by joining the lower surface of the linear to the mold base with the adhesive; charging the curable materials into the mold cavity via the nozzle opening for a charging period; and hardening the curable materials inside the mold cavity into a cake; and separating the wall from the mold base and the cake.