| 摘要 |
In-process units include upper and lower dielectric substrates and a plurality of microelectronic elements disposed between the upper and lower substrates. Each of the upper and lower substrates includes a plurality of regions. Each region of the upper substrate is aligned with a corresponding region of the lower substrate. At least one of the microelectronic elements is disposed between the upper and lower substrates and each of the regions of the upper and lower substrates has interlayer connection terminals at the surface thereof. Vertically elongated electrical conductors are formed from copper and each extend in a vertical direction away from the surface of a dielectric substrate of one of the upper and lower dielectric substrates and have an end joined with an electrically conductive bonding material to the interlayer connection terminal of the region of an other one of the upper and lower dielectric substrates. |
