METALIC PATTERN FOR RETAINNER RING OF CHEMICAL MECHANICAL POLISHING APPARATUS

摘要

PURPOSE: A mold for manufacturing a retainer ring of a chemical mechanical polishing apparatus is provided to reduce a defective rate by preventing a scratch on the outer surface of the retainer ring. CONSTITUTION: A material supply path includes a supply path part (41) and an injection path part (42). A mold body is divided into a first mold body part and a second mold body part. The mold body opens a forming space (30). The supply path part is separated from the outer or inner circumference of the forming space. The injection path part injects melted materials to the forming space.