发明名称 |
Substrate processing method, storage medium storing computer program for performing substrate processing method, and substrate processing apparatus |
摘要 |
In a substrate processing method according to the present invention, a cleaning liquid nozzle supplies a rinsing liquid to a central portion of a substrate and thereafter moves from a position corresponding to the central portion of the substrate to a position corresponding to a peripheral, edge portion thereof while supplying the rinsing liquid before stopping at the position corresponding to the peripheral edge portion. Next, a drying liquid nozzle moves from the position corresponding to the peripheral edge portion to the position corresponding to the central portion while supplying a drying liquid. Then, the drying liquid nozzle is kept stationary at the position corresponding to the central portion for a predetermined period of time while supplying the drying liquid. Thereafter, a gas nozzle moves from the position corresponding to the central portion to the position corresponding to the peripheral edge portion while supplying an inert gas.
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申请公布号 |
US8545640(B2) |
申请公布日期 |
2013.10.01 |
申请号 |
US201113161721 |
申请日期 |
2011.06.16 |
申请人 |
MINAMI TERUOMI;OKAMURA NAOYUKI;KAWABUCHI YOSUKE;TOKYO ELECTRON LIMITED |
发明人 |
MINAMI TERUOMI;OKAMURA NAOYUKI;KAWABUCHI YOSUKE |
分类号 |
B08B3/02 |
主分类号 |
B08B3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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