发明名称 |
Polishing pad, manufacturing method thereof and polishing method |
摘要 |
A polishing pad capable of improving an affinity to polishing liquid and stabilizing polishing performance is provided. A polishing pad 10 is equipped with a urethane sheet 2. The urethane sheet 2 has a polishing surface P for polishing an object to be polished. The urethane sheet 2 is formed by a dry molding method and is formed by slicing a polyurethane foamed body which is obtained by reacting and curing mixed liquid in which an isocyanate-group containing compound, water, a foam control agent and a polyamine compound are mixed. Foams 3 are dispersed approximately uniformly inside the urethane sheet 2. Opened pores 4 which are opened parts of the foams 3 are formed at the polishing surface P. Inside the urethane sheet 2, the foams 3 formed adjacently to each other are communicated by communication holes 9, and the communication holes 9 are formed at a ratio of 800 holes/cm2 or more when observed from a side of the polishing surface P. Polishing liquid moves via the communication holes 9 and the foams 3.
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申请公布号 |
US8545291(B2) |
申请公布日期 |
2013.10.01 |
申请号 |
US201013379588 |
申请日期 |
2010.06.22 |
申请人 |
ITOYAMA KOHKI;TAKAHASHI DAISUKE;UENO JUNICHI;KOBAYASHI SYUICHI;FUJIBO HOLDINGS INC.;SHIN-ETSU HANDOTAI CO., LTD. |
发明人 |
ITOYAMA KOHKI;TAKAHASHI DAISUKE;UENO JUNICHI;KOBAYASHI SYUICHI |
分类号 |
B24B37/04;B24B37/24;H01L21/304 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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