| 摘要 |
An apparatus for vapor deposition of organic material and a deposition method using the same are provided to reduce a size of equipment and a manufacturing cost and facilitate maintenance and repair by not requiring an additional device to rotate a stage for the vapor deposition at a uniform thickness of a thin film. An apparatus for vapor deposition of organic material includes a source supply unit(100), a chamber(250), an injection pipe(160), and a diffusion plate(240). The source supply unit supplies a process gas generated by a vaporization of the organic material deposited on a substrate. The chamber includes a diffusion chamber(260) and a vapor deposition processing chamber(270). The diffusion chamber supplies a diffusion space of the process gas supplied from the source supply unit. The vapor deposition processing chamber supplies an organic vapor deposition space of the substrate. The injection pipe injects the process gas by being extended from the source supply unit to the diffusion chamber. The diffusion plate is positioned between the diffusion chamber and the vapor deposition chamber and 2 dimension-diffuses the process gas injected to the diffusion chamber to supply the process gas to the vapor deposition processing chamber. |
