发明名称 Method for drying a substrate
摘要 An apparatus for drying a workpiece comprising a liquid bath for immersing said workpiece, a deionized water supply for supplying deionized water to said bath, a partially enclosed volume of heated inert gas located above said liquid bath and a heated inert gas supply for supplying heated inert gas. A first holder is used for holding said workpiece in said liquid bath with a vertical orientation between the first holder and said liquid bath and a second holder, comprising a horizontal member, that is able to hold said at least one workpiece in such a way as to substantially prevent said workpiece from sliding along said horizontal member.
申请公布号 US8544482(B2) 申请公布日期 2013.10.01
申请号 US201213463880 申请日期 2012.05.04
申请人 NG KAE JENG;LIANG KIEN HUI;LIANG KIEN YEW;INVENPRO (M) SDN. BHD. 发明人 NG KAE JENG;LIANG KIEN HUI;LIANG KIEN YEW
分类号 B08B3/00 主分类号 B08B3/00
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